VT-3000i Coating System

July 18, 2018
VT-3000i Coating System

Manufacturing and the market have changed significantly since VaporTech began designing and building PVD coating systems more than 20 years ago. These days, industry competition is fierce, and manufacturers must often fight for their customer’s business. For this reason, VaporTech has unveiled its VT-3000i, a new coating system that helps manufacturers differentiate their products and increase their return on investment (ROI) with the latest materials and technologies and a right-sized design for today’s manufacturing needs.

The new VT-3000i system can deposit a wide range of materials using physical vapor deposition (PVD) or plasma-enhanced chemical vapor deposition (PE-CVD), as well as coating temperature-sensitive substrates using its unique low-temperature arc vapor deposition technology (LTAVD). These coating technologies deposit a wide range of metallic colors, from chrome through black, to gold, brass, nickel or bronze, as well as diamond-like carbon (DLC) and an array of functional coatings. Bringing the system in-house enables manufacturers to use VaporTech’s experienced R&D scientists to create unique coatings that differentiate and add value to your products to give them a competitive edge.

The VT-3000i system features a much smaller footprint and updated design that makes the equipment easier to integrate into manufacturing facilities. The system takes up about 40 percent less space than its predecessor. The system is designed to eliminate complexities and increase ease of installation, operation and maintenance.

With the VT-3000i, manufacturers can gain control of the coating process and save considerable time previously spent packaging, sending and waiting for items to be coated by a third party. With the system in place, whole loads can be coated for less than manufacturers spend coating one part with an outside service provider.

Related Glossary Terms

  • chemical vapor deposition ( CVD)

    chemical vapor deposition ( CVD)

    High-temperature (1,000° C or higher), atmosphere-controlled process in which a chemical reaction is induced for the purpose of depositing a coating 2µm to 12µm thick on a tool’s surface. See coated tools; PVD, physical vapor deposition.

  • physical vapor deposition ( PVD)

    physical vapor deposition ( PVD)

    Tool-coating process performed at low temperature (500° C), compared to chemical vapor deposition (1,000° C). Employs electric field to generate necessary heat for depositing coating on a tool’s surface. See CVD, chemical vapor deposition.

  • physical vapor deposition ( PVD)2

    physical vapor deposition ( PVD)

    Tool-coating process performed at low temperature (500° C), compared to chemical vapor deposition (1,000° C). Employs electric field to generate necessary heat for depositing coating on a tool’s surface. See CVD, chemical vapor deposition.

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